ELECTRON BEAM IRRADIATION OF C60(OH)10

S. A. Janjua, A. Robinson

Abstract


The polyhydroxylated fullerene derivative, or fullerol, C60(OH)10, has been investigated as an electron beam resist. Films of fullerol of ∼ 200 nm thickness, were prepared on silicon substrates using spin coating. Upon exposure with electrons at 20 keV the fullerol displayed negative tone resist behaviour after development with isopropyl alcohol:cyclohexanone (1 : 4). The fullerol became insoluble after exposure to a dose of ∼ 10 mC/cm2 for 20 keV electrons.

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